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ASML is a Dutch multinational corporation that designs and manufactures advanced technology for the semiconductor industry . The company was founded in 1984 and is headquartered in Veldhoven, Netherlands .

ASML's primary products are Lithography systems , used by chipmakers to pattern circuits onto silicon Wafers .> These systems use ultraviolet light to shrink the size of features on the Wafers , enabling the production of smaller and more powerful chips.> ASML is one of the leading suppliers of lithography systems in the world, and its customers include major semiconductor manufacturers such as Intel , Samsung , and TSMC (Taiwan Semiconductor Manufacturing Company Limited) .

In addition to lithography systems, the company also provides related products and services, such as metrology systems, software, and maintenance.

ASML produces several types of products for the semiconductor industry, including:

Lithography systems : These are used to pattern circuits onto silicon wafers using ultraviolet light. ASML offers several types of lithography systems, including extreme ultraviolet (EUV) and immersion systems.

Metrology systems : These systems are used to measure and inspect the patterns on silicon wafers, ensuring that they meet the required specifications. ASML's metrology systems include optical and x-ray systems.

Software : ASML provides a range of software solutions to help customers optimize the performance of their lithography systems, including mask synthesis, simulation, and modeling software.

Maintenance and service : ASML offers a variety of services to support customers throughout the lifecycle of their systems, including installation, training, and ongoing maintenance and repair.

DUV - Deep ultraviolet lithography systems , also known as i-line and DUV systems, are used to pattern circuits onto silicon wafers using deep ultraviolet light.

EUV - Extreme ultraviolet lithography systems , also known as EUV systems, are used to pattern circuits onto silicon wafers using extreme ultraviolet light.

These systems are considered the next generation of lithography technology, as they are capable of producing even smaller and more complex patterns than previous systems.

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